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  • TF1400 ℃ CVD Tube Furnace
    1400°C Tube Furnace Chemical Vapor Deposition (CVD) refers to the method of chemical gas or steam reacting on the surface of the substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry to depo
    Date：2023-05-23Model：TF1400 ℃ CVDVisits：991
  • TF1700 ℃ CVD Tube Furnace
    1700°C Tube Furnace Chemical Vapor Deposition (CVD) refers to the method of chemical gas or steam reacting on the surface of the substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry to depo
    Date：2023-05-23Model：TF1700 ℃ CVDVisits：1053
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